Introduction: ABrief History,MOS Transistors, MOSTransistor Theory,IdealI-V Characteristics,NonidealI-VEffects,DCTransferCharacteristics.

Fabrication: nMOSFabrication,CMOSFabrication[Pwellprocess,Nwellprocess,Twintubprocess], BiCMOSTechnology.

MOSandBiCMOSCircuitDesignProcesses: MOSLayers,StickDiagrams,DesignRulesandLayout.

BasicCircuitConcepts: SheetResistance,AreaCapacitancesofLayers,StandardUnitofCapacitance, SomeAreaCapacitanceCalculations,DelayUnit,InverterDelays,DrivingLargeCapacitiveLoads

ScalingofMOSCircuits: ScalingModels&ScalingFactorsforDeviceParameters.

Subsystem Design Processes: Some General considerations, An illustration of Design Processes,Illustration of the Design Processes: Regularity, Design of an ALU Subsystem, The Manchester Carry-chainandAdderEnhancementTechniques

SubsystemDesign: Some ArchitecturalIssues, SwitchLogic, Gate(restoring)Logic,ParityGenerators,Multiplexers, The ProgrammableLogicArray(PLA).

FPGABasedSystems: Introduction,Basicconcepts,DigitaldesignandFPGAs,FPGAbasedSystemdesign,FPGA architecture, Physical designfor FPGAs.

Memory,RegistersandAspectsofsystemTiming: SystemTimingConsiderations,SomecommonlyusedStor age/Memoryelements.

Testing and Verification: Introduction, Logic Verification, Logic Verification Principles,ManufacturingTestPrinciples, Designfortestability.